Photosensitizer, visible light curable resin composition using t

Details Photosensitizer, visible light curable resin composition using t Photosensitizer, visible light curable resin composition using t

1998-08-10

2000-08-22

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 430926, 430913, 522 29, 548405, G03C 1105

Patent

active

06106999&

ABSTRACT:
A visible light curable resin composition containing a photocurable resin, a photoreaction initiator and a photosensitizer having the formula (1). The composition has a very high sensitivity to a general-purpose visible light laser, so that a high-speed scanning exposure is possible by the laser, and an extremely fine high resolution can be obtained. In addition, the composition can be used for coating or printing under safelight irradiating conditions and under bright circumstantial conditions without any thickening of the composition, and hence the composition can exert excellent noticeable effects in points of safe operativity, operational efficiency and the stability of products. Formula (1) is as follows: ##STR1## wherein rings X.sub.1 and X.sub.2 are each an optionally substituted pyrrole ring; Y is H, CN, optionally substituted alkyl, aralkyl, aryl, heteroaryl or alkenyl group; and Z.sub.1 and Z.sub.2 are halogen, optionally substituted alkyl, alkoxy, alkylthio, aralkyl, aralkyloxy, aryl, aryloxy, arylthio, heteroaryl, heteroaryloxy or heteroarylthio group, provided that at least one of substituents on the pyrrole rings X.sub.1 and X.sub.2, groups Z.sub.1 and Z.sub.2 is the alkoxy, aralkyloxy or aryloxy group.

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Boyer, Joseph H. et al.; "Pyrromethene-BF2 compleses as laser dyes." (Dept. Chem., Univ. New Orleans, New Orleans, LA 70148, USA). Heteroat. Chem., 4(1), 39-49 (English) 1993. (and abstract).
Falk, Heinz et al.; "Chemistry of pyrrole pigments. Part XX. Studies on the deprotonation equilibrium and the formation of mental complexes of partial structures of bile pigments." (Inst. Org. Chem. Unive. Wien, Vienna, Austria). Monatsh. Chem., 109(4), (and abstract), 1978.
Falk, Heinz et al.; "Contribution to the chemistry of pyrrole pigments, XIX: The electrochemical oxidation of pyrromethenones and pyrromethenes (bile pigment partial structures)." (Inst. Org. Chem. Unive. Wien, Vienna, Austria). Monatsh. Chem., 109(1), (and abstract), 1978.
Misawa, Nobuyoshi et al.; "Dipyrromethene metal chelate compounds . . . " Japanese Patent No. 10162430 (abstract); Jun. 19, 1998.

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