Methods and apparatus for reducing particle contamination during

Cleaning and liquid contact with solids – Processes – Including work heating or contact with combustion products

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 12, 134 13, 134 18, 118719, 4272481, B08B 704

Patent

active

061066346

ABSTRACT:
The present invention provides methods and apparatus for reducing particulate contamination during the processing of a substrate. In one embodiment, the method includes the step of preheating a substrate in a preheater to a desired temperature. The preheated substrate is transferred from the preheater to a buffer region having a pressure therein that is between about two (2) Torr and about seven hundred and sixty (760) Torr. The preheated substrate is transferred from the buffer region to a reaction chamber. Thermophoretic forces help repel particles away from the substrate surface during substrate transfer.

REFERENCES:
patent: 4718975 (1988-01-01), Bowling et al.
patent: 4728389 (1988-03-01), Logar
patent: 4771608 (1988-09-01), Liu et al.
patent: 4875340 (1989-10-01), Liu et al.
patent: 4928537 (1990-05-01), Liu et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5061444 (1991-10-01), Nazaroff et al.
patent: 5112649 (1992-05-01), Bringmann et al.
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5280983 (1994-01-01), Maydan et al.
patent: 5286296 (1994-02-01), Sato et al.
patent: 5391035 (1995-02-01), Krueger
patent: 5472550 (1995-12-01), Periasamy
patent: 5522933 (1996-06-01), Geller et al.
patent: 5571330 (1996-11-01), Kyogoku
patent: 5630690 (1997-05-01), Salzman
patent: 5656902 (1997-08-01), Lowrance
patent: 5678980 (1997-10-01), Grunes et al.
patent: 5697750 (1997-12-01), Fishkin et al.
patent: 5873942 (1999-02-01), Park et al.
patent: 5876797 (1999-03-01), Beinglass et al.
Isaac Ray, "Particulate Emissions: Evaluating Removal Methods," Environmental Manager, vol. 104, No. 6, Jun., 1997, p. 135.
Alan C. Diebold, Kenton Childs and B.Y.H. Liu, "Advances in te Characterization of Particle and Surface Metallic Contamination," Proceedings of the Third International Symposium on Ultra Clean processing of Silicon Surfaces. UCPSS, Sep. 23,-25, 1996 pp. 53-56.
Huff, H. R.; Goodall, R.K.; Williams, E.; Woo, Keung-Shan; Liu, B.Y.H.; Warner, T.; Hirleman, D.; Gildersleeve, K,; Bullis, W.M.; Scheer, B.W.; and Stover, J.; "Measurement of Silicon Particles by Laser Surface Scanning and Angle-Resolved Light Scattering," Journal of the Electrochemical Society, Vo. 144, No.1, Jan., 1997, pp. 243-50.
Choi, S.J.; Rader, D.J.; and Geller, A.S.; "Massively parallel simulations of Brownian dynamics particle transport in low pressure parallel-plate reactors," Journal of Vacuum Science & Technology A (Vacuum, Surfaces, and Films), vol. 14, No. 2, Mar.-Apr., 1996, pp. 660-665.
Ye, Y.; Pui, D.Y.H.; Liu, B.Y.H.; Opiolka, S.; Blumhorst, S. and Fissan, H.; "Thremophoretic Effect of Particle Deposition on a Free Standing Semiconductor Wafer in a Clean Room," Journal of Aerosol Science, vol. 22, No. 1, 1991, pp. 63-72.
Liu, B.Y.H.; "Recent Advance in Microcontamination Control Research at the University of Minnesota," Electronic Packaging and Corrosion in Microelectronics Proceedings of ASM's Third Conference on electronic Packaging: Materials and Processes and Corrosion in Microelectronics, Apr. 28-30, 1987, pp. 155-60.
Liu, B.Y.H. and Ahn, K.H., "Particle Deposition on Semiconductor Wafers," Aerosol Science and Technology, vol. 6, No. 3, 1987, pp. 215-224.
Rader, D. J.; Geller, A.S.; Choi, S.J.; and Kushner, M.J.; "Particle Transport in Plasma Reactors," Department of Energy, Washington, D.C., Microcontamination 94 Conference proceedings, Oct. 5-6, 1994, (10 pages).
Kinney, Patrick D.; Bae, Gwi-Nam; Phi, David Y.H.; Liu, Benjamin Y.H.; "Particle Behavior in Vacuum Systems: Implicatioons for In-situ Particle Monitoring in Semiconductor Processing Equipment," Journal of te Institute of Environmental Sciences, vol. 39, No. 6, Nov.-Dec. 1996, pp. 40-45.
Pui, David Y.H. and Liu, Benjamin Y.H., "Advances in Microcontamination Research," Journal of Aerosol Science, vol. 25, N. Suppl 1, May 1994, pp. 107-108.
Kuehn, T.H.; Wu, Y.; Liu, B.Y.H.; "Particle Contamination Below a Robot Arm in a Cleanroom," Journal of the IES, vol. 36, No. 5, Sep.-Oct., 1993, pp. 43-50.
Pui, David Y.H.; Ye, Yan; and Liu, Benjamin Y.H.; "Experimental Study of Particle Deposition on Semiconductor Wafers," Aerosol Science and Technology, vol. 12, No. 4, May, 1990, pp. 795-804.
Liu, B. Y. H. and Hsieh, Ker-Ching, "Progress Towards an Absolute, Zero Particle Gas," Proceedings, Annual Technical Meeting--Institute of Environmental Sciences, Published by Inst. of Environmental Sciences, Mount Prospect, IL; 35th Annual Technical Meeting Building Tomorrow's Environment May 1-5, 1989, pp. 397-400.
Liu, Benjamin Y H.; "Microcontamination Control Research and University-Industry Collaboration," Proceedings Annual Technical Meeting--Institute of Environmental Sciences, Published by Inst. of Environmental Sciences, Mount Prospect, IL; 35th Annual Technical Meeting Building Tomorrow's Environment, May 1-5, 1989, pp. 345-347.
Liu, B. Y. H., "Contamination Control in Semiconductor Manufacturing and Particle Deposition on Wafer Surfaces," Optical Materials for High-power Lasers--Symposium; also known as the 27th Annual Boulder Damage Symposium; Laser-Induced Damage in Optical Materials, Twenty-seventh Symposium ,Oct. 30--Nov. 1, 1995, pp. 685-686.
Rader, D J.; Geller, A.S.; Choi, S.J.; and Kushner, M.J.; "Application of Numerical Models to Reduce Particle Contamination in Semiconductor Process Environments," Annual Technical Meeting--Institute of Environmental Sciences, vol. 40, PT1, May, 1994, pp. 308-315.
Liu, Benjamin Y. H. and Jin, Ziaoliang, "Real-time Particle Monitoring in a Plasma-enhanced Chemical Vapor Deposition System," Mount Prospect, IL Institute of Environmental Sciences ,Proceedings of the 43rd IES Annual Technical Symposium, Los Angeles, CA, May 4-8, 1997, pp. 34-42.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Methods and apparatus for reducing particle contamination during does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods and apparatus for reducing particle contamination during, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and apparatus for reducing particle contamination during will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-576150

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.