Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1997-11-26
2000-01-18
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427212, 427215, 427216, 427222, 427122, 4272497, 427600, 427906, C23C 1650, C23C 1626, B22F 102
Patent
active
060155973
ABSTRACT:
A method for making particles coated with a diamond-like network, which can include additive components. The method comprises subjecting a multiplicity of particles to a carbon-based plasma in an evacuated radio frequency powered capacitively coupled reactor system in which ion sheaths are formed around the electrodes and wherein the particles are agitated in such a manner as to expose their surfaces to the reactive species in the plasma while keeping the particles substantially within an ion sheath.
The advantages of the present invention include (i) the efficient deposition of DLN onto particles at high deposition rates, (ii) the deposition of densely-packed DLN coatings, (iii) the ability to perform in situ surface cleaning of particles by ion bombardment with oxygen- and argon-containing plasmas prior to deposition of DLN, and (iv) the ability to tailor the bulk and surface properties of the coatings by manipulating the composition of the coating and the intensity of ion bombardment during the coating process.
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David M., Padiyath, R., Babu, S.V., Plasma Deposition and Etching of Diamond-Like Carbon Films, vol. 37, No. 3 AICHE Journal (Mar., 1991) pp. 367-376.
Silva, S.R.P., et al, "Diamond-Like Carbon Thin Film Deposition Using A Magnetically Confined R.F. PECVD System", Diamond and Related Materials, vol. 4, No. 7, May 15, 1995, pp. 997-983.
Chia-Fu Chen et al, "Microwave Plasma Chemical Vapour Deposition of Diamond: Its growth and characterization",: Surface and Coatings Technology, vol. 43-44, No. 1-3, pp. 53-62, Dec. 5, 1990.
3M Innovative Properties Company
Gover Melanie
King Roy V.
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