Vacuum processing method

Details Vacuum processing method Vacuum processing method

1997-02-25

2000-01-18

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429803, 427 8, 216 59, 216 60, C23C 1454

Patent

active

060154780

ABSTRACT:
A vacuum processing apparatus includes a process chamber capable of being evacuated and a gas quantity detector for outputting a gas quantity signal corresponding to a partial pressure of each kind of gas contained in the process chamber. The gas quantity detector has a detection sensitivity set in response to a sensitivity calibration signal externally supplied and generates the gas quantity signal at the set detection sensitivity. The gas quantity signal output from the gas quantity detector is obtained. The sensitivity calibration signal is input to the gas quantity detector so that a magnitude of the gas quantity signal for one reference gas selected from gasses contained in the process gas becomes near a target value. Vacuum processing techniques are provided for stably detecting the content of impurity gas by calibrating the sensitivity of the gas quantity detector.

REFERENCES:
patent: 4172020 (1979-10-01), Tisone et al.
patent: 4362936 (1982-12-01), Hofmann et al.

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