Semiconductor device having lower minority carrier noise

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257394, 257400, H01L 27108

Patent

active

060876913

ABSTRACT:
On a p.sup.++ substrate (1) provided is a p.sup.- epitaxial layer (2) having an impurity concentration lower than that of the p.sup.++ substrate (1). A p well (3) is formed in a portion of the p.sup.- epitaxial layer 2 and further n.sup.+ diffusion layers (4a and 4b) are selectively formed in the p well (3). A memory cell capacitor (5) is connected onto the n.sup.+ diffusion layer 4b. On the other hand, an no diffusion layer (6) is selectively formed in the p.sup.- epitaxial layer (2) separately from the p well (3), to which an external signal input circuit (7) is connected. Further, a p.sup.++ diffusion layer 9a is provided between the external signal input circuit (7) serving as a source for injection of the minority carriers, i.e., electrons and the n.sup.+ diffusion layer (4b) connected to the memory cell capacitor (5), for blocking the entry of the minority carries. The p.sup.++ diffusion layer (9a) extends up to such a depth as to reach the p.sup.++ substrate (1) from a surface of the p.sup.- epitaxial layer (2). Having this structure, a semiconductor device which does not allow the electrons injected to the p.sup.- epitaxial layer from the external signal input circuit to reach the memory cell capacitor can be provided.

REFERENCES:
patent: 4044373 (1977-08-01), Nomiya et al.
patent: 4163245 (1979-07-01), Kinoshita
patent: 4315781 (1982-02-01), Henderson
patent: 4587542 (1986-05-01), Rao
patent: 4635085 (1987-01-01), Taguchi
patent: 4658283 (1987-04-01), Koyama
patent: 4695864 (1987-09-01), Kawamoto
patent: 5789789 (1998-08-01), Hayakawa

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