Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-03-16
1992-01-14
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430282, 430906, 430905, 430910, 430326, 430330, G03F 730, G03F 740, G03F 7039
Patent
active
050810006
ABSTRACT:
The invention provides photosensitive mixtures consisting of a polymer and a photoactive component which meet the requirements placed on photoresists. The polymer has carboxylic acid anhydride groups or phenolic hydroxyl groups and the photoactive component is an N-alkylated or N-arylated 1.4-dihydropyridine or a 1.4- dihydropyridine derivative of the following structure: ##STR1## where the R group is a (substituted) aryl group, which, in the ortho position to the bond with the dihydropyridine ring, carries a NO.sub.2 group; and R.sup.3 is alkyl, cyclohexyl or phenyl.
REFERENCES:
patent: 3647807 (1972-03-01), Bossert et al.
patent: 3773773 (1973-11-01), Bossert
patent: 3776735 (1973-12-01), Bauer et al.
patent: 3803314 (1974-04-01), Bossert et al.
patent: 3883543 (1975-05-01), Bossert
patent: 3901710 (1975-08-01), Ranz et al.
patent: 3946028 (1976-03-01), Bossert et al.
patent: 4604340 (1986-08-01), Grossa
patent: 4849051 (1989-07-01), Ahne et al.
"Angew. Chem."--Applied Chemistry, vol. 94 (1982), pp. 471-485.
Patent Abstracts of Japan, vol. 8, No. 79 (P. 267) (1516) Apr. 11, 1984 "Positive Type Photosensitive Composition".
Research Disclosure, No. 174, Oct. 1978 "Photosensitive Materials Suited for the Production of Positive Photoresists".
Polymer Engineering and Science, vol. 23, No. 17 (1983) pp. 953-956 "Possibilities for Photoimaging Using Onium Salts".
Ahne Hellmut
Hammerschmidt Albert
Kuehn Eberhard
Schmidt Erwin
Hamilton Cynthia
Siemens Aktiengesellschaft
LandOfFree
Photosensitive mixture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive mixture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive mixture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-540762