Silsesquioxane polymers, method of synthesis, photoresist compos

Details Silsesquioxane polymers, method of synthesis, photoresist compos Silsesquioxane polymers, method of synthesis, photoresist compos

1998-09-03

2000-07-11

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430927, 522172, 523107, 528 10, G03C 1725, G03F 7004

Patent

active

060870648

ABSTRACT:
Novel silsesquioxane polymers are formed by methods which avoid the use of BBr.sub.3. The novel silsesquioxane polymers are especially useful in negative photoresist compositions and photolithographic processes. Alternatively, improved silsesquioxane polymer-containing negative photoresist compositions are obtained by using a polymer component containing a blend of silsesquioxane polymer and non-silsesquioxane polymer. The photoresist compositions provide improved dissolution characteristics enabling the use of 0.26 N TMAH developer. The photoresist compositions also provide improved thermal characteristics enabling use of higher processing temperatures. The photoresist compositions are especially useful in a multilayer photolithographic processes and are capable of producing high resolution.

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