Photosensitive polymer-containing systems with increased shelf-l

Details Photosensitive polymer-containing systems with increased shelf-l Photosensitive polymer-containing systems with increased shelf-l

1995-01-17

1996-11-19

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302831, 4302841, 4302871, 4302881, 430920, 430922, 522 63, 522 75, 522 79, 522116, G03C 173

Patent

active

055761461

ABSTRACT:
A photosensitive polymer-containing system containing: (a) an energy sensitive polymer having a linear hydrocarbyl backbone and pendant peptide groups with free-radically polymerizable functionality attached thereto; (b) a vinyl-halomethyl-s-triazine capable of free-radical generation upon excitation with electromagnetic radiation having a wavelength of from about 330 to 500 nm; (c) an organic acid having a pKa of from about 1.8 to 5.5; (d) a leuco dye; and (e) a binder. A colorant may optionally be added. The photosensitive systems exhibit an increased shelf-life and excellent photosensitivity.

REFERENCES:
patent: 3448089 (1969-06-01), Celeste
patent: 3583950 (1971-06-01), Kollinsky et al.
patent: 3598790 (1971-08-01), Kollinsky et al.
patent: 4111922 (1978-09-01), Beede et al.
patent: 4199362 (1980-04-01), Yoshida et al.
patent: 4288523 (1981-09-01), Taylor
patent: 4304705 (1981-12-01), Heilmann et al.
patent: 4304923 (1981-12-01), Rousseau
patent: 4378411 (1983-03-01), Heilmann et al.
patent: 4451619 (1984-05-01), Heilmann et al.
patent: 4547449 (1985-10-01), Alexandrovich et al.
patent: 4647525 (1987-03-01), Miller
patent: 4737560 (1988-04-01), Heilmann et al.
patent: 4889932 (1989-12-01), Miller
patent: 4914165 (1990-04-01), Klun et al.
patent: 5077178 (1991-12-01), Hebert et al.
patent: 5235015 (1993-08-01), Ali et al.

Affiliated with

Also associated with

Rating

Photosensitive polymer-containing systems with increased shelf-l does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive polymer-containing systems with increased shelf-l, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polymer-containing systems with increased shelf-l will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-539924