Novel electron beam resist materials

Details Novel electron beam resist materials Novel electron beam resist materials

1986-04-15

1988-06-14

Bleutge, John C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

428421, 156643, 430296, 522162, 528364, 528382, 525451, 525502, C08G 7522, G03C 1495

Patent

active

047511680

ABSTRACT:
Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.

REFERENCES:
patent: 3313785 (1967-04-01), Zutty
patent: 3893127 (1975-07-01), Kaplan
patent: 3898350 (1975-08-01), Gipstein
patent: 3932369 (1976-01-01), Sartori
patent: 4289845 (1981-09-01), Bowden
patent: 4409317 (1983-10-01), Shiraishi
patent: 4421843 (1983-12-01), Hattori

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