Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

1998-02-05

1999-12-21

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 522 31, G03F 7004

Patent

active

060047216

ABSTRACT:
A positive photoresist composition is disclosed which comprises (a) a resin obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group having a specific structure, (b) a compound which generates an acid upon irradiation with actinic rays or a radiation, and (c) a solvent. This composition is an excellent, chemically amplified photoresist composition which has high resolution and gives a resist pattern having no depressions in an upper part thereof and having satisfactory adhesion to the substrate.

REFERENCES:
patent: 5852128 (1998-12-01), Padmanaban et al.
patent: 5876900 (1999-03-01), Watanabe et al.

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