Plasma CVD method

Details Plasma CVD method Plasma CVD method

1993-03-23

1994-08-23

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

4272552, 4272553, 427294, 427574, 427580, 427585, 427598, B05D 306

Patent

active

053406214

ABSTRACT:
A plasma CVD method and the device for generating an arc discharging plasma, together with introducing both a material gas and a reactive gas into a vacuum chamber; coating a substrate with a thin film which contains a material gas component and a reactive gas component, said plasma CVD method comprising the steps of: introducing said material gas into a position between the arc discharging plasma and the substrate; and introducing said reactive gas into a space opposite, relative to the arc discharging plasma, to a side whereinto the material gas is introduced.

REFERENCES:
"Vacuum (Shinku)", Joshin Uramoto, vol. 25, No. 10 (Jun. 1982), pp. 660-670.

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