Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-12-19
1998-05-05
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429825, C23C 1434
Patent
active
057468931
ABSTRACT:
A method of manufacturing a magnetic recording medium by using an in-line sputtering apparatus to successively form, on a substrate, at least one underlying layer, a first magnetic CoPt-based film, a nonmagnetic intermediate film, and a second magnetic CoPt-based film. The underlying film and/or the nonmagnetic film, which are in contact with the first magnetic film, are deposited at a low sputtering power between 100 and 1000 watts to improve the magnetic properties of the magnetic recording medium. Low power sputtering is also effective to improve the distribution of difference of the crystal lattice spacings between the nonmagnetic intermediate film and the first magnetic film and between the underlying layer and the first magnetic film.
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Patent Abstracts of Japan, JP-6020321, vol. 18, No. 235, dated Apr. 28, 1994.
Horikawa Jun-ichi
Kawai Hisao
Kobayashi Masato
Moroishi Keiji
Nozawa Osamu
Hoya Corporation
Weisstuch Aaron
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