Photosensitive composition and photopolymerizable composition em

Details Photosensitive composition and photopolymerizable composition em Photosensitive composition and photopolymerizable composition em

1989-08-11

1991-03-05

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430342, 430343, 430915, 430920, 430925, 430926, 430944, 430921, 522 16, 522 26, G03C 173, G03F 728

Patent

active

049977458

ABSTRACT:
A photosensitive composition comprising a trihalomethyl-s-triazine compound and a photosensitizer, wherein the photosensitizer being a dye having a reduction potential not more than 0.10 volt higher than the reduction potential of the trihalomethyl-s-triazine compound, and a photopolymerizable composition employing the photosensitive composition.

REFERENCES:
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4774163 (1988-09-01), Higashi
patent: 4810618 (1989-03-01), Koike et al.
patent: 4837128 (1989-06-01), Kawamma et al.
patent: 4845011 (1989-07-01), Wilczak et al.
patent: 4859572 (1989-08-01), Farid et al.

Affiliated with

Also associated with

Rating

Photosensitive composition and photopolymerizable composition em does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition and photopolymerizable composition em, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition and photopolymerizable composition em will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-496106