X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1994-07-15

1995-09-05

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 34, 378 85, G21K 106

Patent

active

054486122

ABSTRACT:
An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

REFERENCES:
patent: 5159621 (1992-10-01), Watanabe et al.
patent: 5195113 (1993-03-01), Kuwabara

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