Sputtering target and method of preparing same

Details Sputtering target and method of preparing same Sputtering target and method of preparing same

1987-04-03

1989-03-21

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, 204298, 420 83, 148301, 148303, C23C 1400

Patent

active

048140538

ABSTRACT:
A sputtering target suitable for use in preparing a magneto-optic recording medium having the composition:

REFERENCES:
patent: 4081297 (1978-03-01), Nagel et al.
patent: 4135953 (1979-01-01), Nagel et al.
patent: 4221613 (1980-09-01), Imaizumi et al.
patent: 4620872 (1986-11-01), Hijikata et al.
patent: 4695514 (1987-09-01), Takahashi et al.
patent: 4710242 (1987-12-01), Yamagishi et al.
"Method of Making Rare Earth Transition Metal Alloy Sputtering Targets", Xerox Disclosure Journal, vol. 10, No. 4, Jul./Aug. 1985, pp. 187-188.

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