Methods of forming a film on a substrate using complexes having

Details Methods of forming a film on a substrate using complexes having Methods of forming a film on a substrate using complexes having

1998-08-27

2000-10-17

Bowers, Charles

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

H01L 21324

Patent

active

061331619

ABSTRACT:
Methods of forming a film on a substrate using chemical vapor deposition techniques and pyrazolyl complexes. The complexes and methods are particularly suitable for the preparation of semiconductor structures.

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Versteeg et al., "Metalorganic Chemical Vapor Deposition By Pulsed Liquid Injection Using An Ultrasonic Nozzle: Titanium Dioxide on Sapphire from Titanium (IV) Isopropoxide," Journal of the American Ceramic Soc., 78, 2763-2768 (1995).

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