Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Patent
1998-08-27
2000-10-17
Meeks, Timothy
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
438778, 438781, 42725531, 4273722, C23L 1640
Patent
active
061331597
ABSTRACT:
The present invention provides methods for the preparation of ruthenium oxide films from liquid ruthenium complexes of the formula (diene)Ru(CO).sub.3 wherein "diene" refers to linear, branched, or cyclic dienes, bicyclic dienes, tricyclic dienes, fluorinated derivatives thereof, combinations thereof, or derivatives thereof additionally containing heteroatoms such as halide, Si, S, Se, P, As, N, or O.
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Marsh Eugene P.
Vaartstra Brian A.
Meeks Timothy
Micro)n Technology, Inc.
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