Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1997-11-03
1999-08-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118724, 118733, C23C 1600
Patent
active
059420383
ABSTRACT:
A novel semiconductor fabrication chamber includes a quartz vessel and a metal vessel with a resilient sealing member disposed between the quartz and metal vessels to define a vacuum chamber, along with a cooling assembly mounted on a quartz flange extending around the perimeter of the quartz vessel. A liquid or gaseous cooling medium is passed through the cooling assembly to reduce the operating temperature of a portion of the resilient sealing member in contact with the quartz flange during semiconductor fabrication processing so as to extend the useful life of the sealing member. The cooling assembly is secured to the quartz flange using a plurality of clamping fixtures for easy installation and retrofitting.
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Barber Rennie
Mayeda Mark
Bueker Richard
LSI Logic Corporation
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