Mask repair system

Details Mask repair system Mask repair system

1989-03-24

1990-03-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156656, 1566591, 156345, 21912112, 21912135, 427 8, 427142, 427259, 427264, 427271, 430 5, 430296, 430938, B44C 122, C23F 102, B32B 3500, B05D 500

Patent

active

049063260

ABSTRACT:
A method and apparatus for inspecting and repairing a mask usable in the manufacture of semiconductor microcircuits, by using an electron beam is disclosed. The inspection and repair of a mask pattern are made in a single apparatus, by using a controlled current of an electron beam. For inspection, the surface of a mask having a mask pattern and a radiation-sensitive layer, covering it, is scanned with an electron beam and, by detecting secondary electrons or reflected electrons caused at that time, the state of the pattern is inspected. If any defect is detected, the portion of the radiation-sensitive layer on the detected defect is irradiated with an electron beam of greater magnitude than that for the inspection and, thereafter, the exposed portion of the radiation-sensitive layer is removed. Then, etching or plating is made to the thus uncovered portion, whereby repair of the mask pattern is made.

REFERENCES:
patent: 4200668 (1980-04-01), Segal et al.
patent: 4256778 (1981-03-01), Mizukami et al.
patent: 4623607 (1986-11-01), Hosogai
patent: 4778693 (1988-10-01), Drozdowicz et al.

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