Photopolymerizable compositions containing organoboron compounds

Details Photopolymerizable compositions containing organoboron compounds Photopolymerizable compositions containing organoboron compounds

1988-10-12

1990-11-20

McCamish, Marion C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430781, 430783, 430271, 430300, 430915, 430916, 522 25, G03C 173, G03F 7027

Patent

active

049718916

ABSTRACT:
Disclosed is a photopolymerizable composition comprising (i) a monomer having at least one ethylenic unsaturated group which is polymerizable by means of active light, (ii) an organoboron compound, and (iii) a pyrylium or thiopyrylium dye. The composition is useful, for example, as photosensitive layers for photosensitive printing plates which are sensitive and respond to an argon laser light source.

REFERENCES:
patent: 3775130 (1973-11-01), Enomoto et al.
patent: 4307182 (1981-12-01), Dalzell et al.
patent: 4343891 (1982-08-01), Aasen et al.
patent: 4416961 (1983-11-01), Drexhage
patent: 4474868 (1984-10-01), Yamaoka et al.

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