Photoflashing a liquid polymer layer on a phototool surface expo

Details Photoflashing a liquid polymer layer on a phototool surface expo Photoflashing a liquid polymer layer on a phototool surface expo

1986-04-02

1990-09-04

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430312, 430322, 430325, 430327, 430394, G03C 178

Patent

active

049544217

ABSTRACT:
A liquid photopolymer layer covering a phototool image surface with one surface exposed to air is exposed by radiation through the phototool to partially harden in a pattern defined by the image the photopolymer layer through a part of its thickness. The air exposed surface portion is thus left in liquid form for contacting the surface of a printed wiring board, preferably by scanning along the length of a phototool with a pressurized roll or blade to contact and adhere the preimaged laminate to board surface in an air bubble free lamination where subsequent radiation exposure finishes the curing and bonds the cured portion of the polymer layer to the PWB substrate. After removal of the phototool, the polymer layer is developed by washing out uncured polymer portions as defined by the image pattern.

REFERENCES:
patent: 4528261 (1985-07-01), Hauser

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