Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1991-11-22
1994-03-22
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31411151, 31411171, 333 99PL, 20429838, 118723AN, H01J 724
Patent
active
052967840
ABSTRACT:
Apparatus for the production of glow discharge, preferably for a large-area plasma CVD process, including a vacuum coating chamber (K) and a microwave waveguide resonator with one or more coupling points, wherein the resonator is made in the form of a microwave waveguide ring resonator (13, 13'), reaction zones (R) are formed at the coupling points between the microwave waveguide ring resonator (13, 13') and the vacuum chamber (K), and in each case a series of magnets (5, 5', . . . ; 6, 6', . . . ) of different polarity are provided, so that in front of the reaction zone (R) individual tunnels of magnetic field lines (16, 16') running parallel thereto are formed and each magnetic field (16, 16') encloses a spatially uniform plasma tube (17) in the reaction zone (R).
REFERENCES:
patent: 3255404 (1966-06-01), Kidwell
patent: 4987346 (1991-01-01), Katzachner et al.
patent: 5021919 (1991-06-01), Engemann
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5227695 (1993-07-01), Pelletier et al.
Geisler Michael
Jung Michael
Koetter-Faulhaber Rudolf
Leybold Aktiengesllschaft
Pascal Robert J.
Shingleton Michael B.
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