Photosensitive compounds and thermally stable and aqueous develo

Details Photosensitive compounds and thermally stable and aqueous develo Photosensitive compounds and thermally stable and aqueous develo

1987-05-08

1991-07-23

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430191, 430192, 430291, 430293, G03C 1492

Patent

active

050343041

ABSTRACT:
Selected photosensitive compounds activated by deep ultraviolet radiation or x-rays and capable of being employed at very low concentrations in photosensitive compositions are provided for producing thermally stable and aqueously developable, negative images on surfaces. The selected photosensitive compounds are halogenated organic compounds, including 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane, which generate an inorganic halogen acid upon exposure to deep UV or other short wavelength radiations. They may be used at concentrations of less than 5 weight percent of the total solids content of the photosensitive composition to produce aqueously developable negative images using deep UV exposure.

REFERENCES:
patent: 3692560 (1972-09-01), Rosenkranz et al.
patent: 4404272 (1983-09-01), Stahlhofen

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