Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2007-10-19
2011-12-27
McDonald, Rodney (Department: 1724)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120
Reexamination Certificate
active
08083908
ABSTRACT:
A vacuum deposition method for fabricating high-strength nitinol films by sputter depositing nickel and titanium from a heated sputtering target, and controlling the sputter deposition process parameters in order to create high-strength nitinol films that exhibit shape memory and/or superelastic properties without the need for precipitation annealing to attenuate the transition conditions of the deposited material. A vacuum deposited nitinol film having high-strength properties equal to or better than wrought nitinol films and which are characterized by having non-columnar crystal grain structures.
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Banas Christopher E.
Boyle Christopher T.
Marton Denes
Wiseman Roger W.
Advanced Bio Prosthetic Surfaces, Ltd.
McDonald Rodney
Rosenbaum & Silvert, P.C.
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