Surface pre-treatment for enhancement of nucleation of high...

Details Surface pre-treatment for enhancement of nucleation of high... Surface pre-treatment for enhancement of nucleation of high...

2010-06-04

2011-12-06

Chen, Bret (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S255310, C427S307000, C117S088000, C117S090000

Reexamination Certificate

active

08071167

ABSTRACT:
Embodiments of the present invention relate to a surface preparation treatment for the formation of thin films of high k dielectric materials over substrates. One embodiment of a method of forming a high k dielectric layer over a substrate includes pre-cleaning a surface of a substrate to remove native oxides, pre-treating the surface of the substrate with a hydroxylating agent, and forming a high k dielectric layer over the surface of the substrate. One embodiment of a method of forming a hafnium containing layer over a substrate includes introducing an acid solution to a surface of a substrate, introducing a hydrogen containing gas and an oxygen containing gas to the surface of the substrate, and forming a hafnium containing layer over the substrate.

REFERENCES:
patent: 4693208 (1987-09-01), Sakai
patent: 5290609 (1994-03-01), Horiike et al.
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5521126 (1996-05-01), Okamura et al.
patent: 5807792 (1998-09-01), Ilg et al.
patent: 5916365 (1999-06-01), Sherman
patent: 6013553 (2000-01-01), Wallace et al.
patent: 6020024 (2000-02-01), Maiti et al.
patent: 6020243 (2000-02-01), Wallace et al.
patent: 6025627 (2000-02-01), Forbes et al.
patent: 6060755 (2000-05-01), Ma et al.
patent: 6124158 (2000-09-01), Dautartas et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6149829 (2000-11-01), Takamatsu et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6238734 (2001-05-01), Senzaki et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6284652 (2001-09-01), Charneski et al.
patent: 6287965 (2001-09-01), Kang et al.
patent: 6291283 (2001-09-01), Wilk
patent: 6291867 (2001-09-01), Wallace et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6299294 (2001-10-01), Regan
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6348386 (2002-02-01), Gilmer
patent: 6348420 (2002-02-01), Raaijmakers et al.
patent: 6372598 (2002-04-01), Kang et al.
patent: 6391785 (2002-05-01), Satta et al.
patent: 6391803 (2002-05-01), Kim et al.
patent: 6395650 (2002-05-01), Callegari et al.
patent: 6399208 (2002-06-01), Baum et al.
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6420279 (2002-07-01), Ono et al.
patent: 6451119 (2002-09-01), Sneh et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6452229 (2002-09-01), Krivokapic
patent: 6462367 (2002-10-01), Marsh et al.
patent: 6468924 (2002-10-01), Lee et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6475910 (2002-11-01), Sneh
patent: 6482262 (2002-11-01), Elers et al.
patent: 6492283 (2002-12-01), Raaijmakers et al.
patent: 6514808 (2003-02-01), Samavedam et al.
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6552485 (2003-04-01), Gehring et al.
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6607973 (2003-08-01), Jeon
patent: 6620723 (2003-09-01), Byun et al.
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6635589 (2003-10-01), Yamazaki et al.
patent: 6642131 (2003-11-01), Harada
patent: 6674138 (2004-01-01), Halliyal et al.
patent: 6713846 (2004-03-01), Senzaki
patent: 6737341 (2004-05-01), Yamamoto et al.
patent: 6794314 (2004-09-01), Raaijmakers et al.
patent: 6803272 (2004-10-01), Halliyal et al.
patent: 6815285 (2004-11-01), Choi et al.
patent: 6844604 (2005-01-01), Lee et al.
patent: 6919263 (2005-07-01), Aronowitz et al.
patent: 2001/0000866 (2001-05-01), Sneh et al.
patent: 2001/0002280 (2001-05-01), Sneh
patent: 2001/0009695 (2001-07-01), Saanila et al.
patent: 2001/0021589 (2001-09-01), Wilk
patent: 2001/0024387 (2001-09-01), Raaijmakers et al.
patent: 2001/0024871 (2001-09-01), Yagi
patent: 2001/0028924 (2001-10-01), Sherman
patent: 2001/0029092 (2001-10-01), Park et al.
patent: 2001/0029891 (2001-10-01), Oh et al.
patent: 2001/0031562 (2001-10-01), Raaijmakers et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2002/0000598 (2002-01-01), Kang et al.
patent: 2002/0005556 (2002-01-01), Cartier et al.
patent: 2002/0008297 (2002-01-01), Park et al.
patent: 2002/0014647 (2002-02-01), Seidl et al.
patent: 2002/0015790 (2002-02-01), Baum et al.
patent: 2002/0029092 (2002-03-01), Gass
patent: 2002/0031618 (2002-03-01), Sherman
patent: 2002/0043666 (2002-04-01), Parsons et al.
patent: 2002/0047151 (2002-04-01), Kim et al.
patent: 2002/0064970 (2002-05-01), Chooi et al.
patent: 2002/0074588 (2002-06-01), Lee
patent: 2002/0076831 (2002-06-01), Akimoto
patent: 2002/0076837 (2002-06-01), Hujanen et al.
patent: 2002/0081826 (2002-06-01), Rotondaro et al.
patent: 2002/0081844 (2002-06-01), Jeon et al.
patent: 2002/0086111 (2002-07-01), Byun et al.
patent: 2002/0093046 (2002-07-01), Moriya et al.
patent: 2002/0093781 (2002-07-01), Bachhofer et al.
patent: 2002/0098627 (2002-07-01), Pomarede et al.
patent: 2002/0106536 (2002-08-01), Lee et al.
patent: 2002/0142500 (2002-10-01), Foglietti et al.
patent: 2002/0146895 (2002-10-01), Ramdani et al.
patent: 2002/0151152 (2002-10-01), Shimamoto et al.
patent: 2002/0153579 (2002-10-01), Yamamoto
patent: 2002/0155722 (2002-10-01), Satta et al.
patent: 2002/0162506 (2002-11-01), Sneh et al.
patent: 2002/0172768 (2002-11-01), Endo et al.
patent: 2002/0175393 (2002-11-01), Baum et al.
patent: 2002/0177282 (2002-11-01), Song
patent: 2002/0182320 (2002-12-01), Leskela et al.
patent: 2002/0187256 (2002-12-01), Elers et al.
patent: 2002/0195643 (2002-12-01), Harada
patent: 2002/0197881 (2002-12-01), Ramdani et al.
patent: 2003/0013320 (2003-01-01), Kim et al.
patent: 2003/0015764 (2003-01-01), Raaijmakers et al.
patent: 2003/0031807 (2003-02-01), Elers et al.
patent: 2003/0032281 (2003-02-01), Werkhoven et al.
patent: 2003/0049931 (2003-03-01), Byun et al.
patent: 2003/0049942 (2003-03-01), Haukka et al.
patent: 2003/0060057 (2003-03-01), Raaijmakers et al.
patent: 2003/0068437 (2003-04-01), Nakamura et al.
patent: 2003/0072975 (2003-04-01), Shero et al.
patent: 2003/0082296 (2003-05-01), Elers et al.
patent: 2003/0082301 (2003-05-01), Chen et al.
patent: 2003/0089942 (2003-05-01), Bhattacharyya
patent: 2003/0096473 (2003-05-01), Shih et al.
patent: 2003/0104710 (2003-06-01), Visokay et al.
patent: 2003/0106490 (2003-06-01), Jallepally et al.
patent: 2003/0109114 (2003-06-01), Niwa
patent: 2003/0116804 (2003-06-01), Visokay et al.
patent: 2003/0133861 (2003-06-01), Bowen et al.
patent: 2003/0129826 (2003-07-01), Werkhoven et al.
patent: 2003/0160277 (2003-08-01), Bhattacharyya
patent: 2003/0168750 (2003-09-01), Basceri et al.
patent: 2003/0173586 (2003-09-01), Moriwaki et al.
patent: 2003/0185980 (2003-10-01), Endo
patent: 2003/0186495 (2003-10-01), Saanila et al.
patent: 2003/0186561 (2003-10-01), Law et al.
patent: 2003/0188682 (2003-10-01), Tois et al.
patent: 2003/0189232 (2003-10-01), Law et al.
patent: 2003/0190423 (2003-10-01), Yang et al.
patent: 2003/0194853 (2003-10-01), Jeon
patent: 2003/0205729 (2003-11-01), Basceri et al.
patent: 2003/0213987 (2003-11-01), Basceri et al.
patent: 2003/0219942 (2003-11-01), Choi et al.
patent: 2003/0227033 (2003-12-01), Ahn et al.
patent: 2003/0232501 (2003-12-01), Kher et al.
patent: 2003/0232506 (2003-12-01), Metzner et al.
patent: 2003/0232511 (2003-12-01), Metzner et al.
patent: 2003/0234417 (2003-12-01), Raaijmakers et al.
patent: 2003/0235961 (2003-12-01), Metzner et al.
patent: 2004/0005749 (2004-01-01), Choi et al.
patent: 2004/0007747 (2004-01-01), Visokay et al.
patent: 2004/0009307 (2004-01-01), Koh et al.
patent: 2004/0009675 (2004-01-01), Eissa et al.
patent: 2004/0016973 (2004-01-01), Rotondaro et al.
patent: 2004/0018723 (2004-01-01), Byun et al.
patent: 2004/0018747 (2004-01-01), Lee et al.
patent: 2004/0023461 (2004-02-01), Ahn et al.
patent: 2004/0023462 (2004-02-01), Rotondaro et al.
patent: 2004/0028952 (2004-02-01), Cartier et al.
patent: 2004/0029321 (2004-02-01), Ang et al.
patent: 2004/0033698 (2004-02-01), Lee et al.
patent: 2004/0036111 (2004-02-01), Nishikawa et al.
patent: 2004/0038554 (2004-02-01), Ahn et al.
patent: 2004/0040501 (2004-03-01), Vaartstra
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