Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2009-11-24
2011-12-20
Lund, Jeffrie R (Department: 1716)
Coating apparatus
Gas or vapor deposition
C118S724000, C118S7230ER, C156S345330, C156S345340, C156S345430, C156S345470
Reexamination Certificate
active
08080107
ABSTRACT:
A showerhead electrode assembly of a plasma processing apparatus includes a thermal control plate attached to a showerhead electrode, and a top plate attached to the thermal control plate. At least one thermal bridge is provided between opposed surfaces of the thermal control plate and the top plate to allow electrical and thermal conduction between the thermal control plate and top plate. A lubricating material between the thermal bridge and the top plate minimizes galling of opposed metal surfaces due to differential thermal expansion between the top plate and thermal control plate. A heater supported by the thermal control plate cooperates with the temperature controlled top plate to maintain the showerhead electrode at a desired temperature.
REFERENCES:
patent: 3448352 (1969-06-01), Ferree
patent: 5534751 (1996-07-01), Lenz et al.
patent: 5569356 (1996-10-01), Lenz et al.
patent: 5653808 (1997-08-01), MacLeish et al.
patent: 5766364 (1998-06-01), Ishida et al.
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5950925 (1999-09-01), Fukunaga et al.
patent: 5964947 (1999-10-01), Zhao et al.
patent: 5977552 (1999-11-01), Foad
patent: 6036782 (2000-03-01), Tanaka et al.
patent: 6050216 (2000-04-01), Szapucki et al.
patent: 6073577 (2000-06-01), Lilleland et al.
patent: 6079356 (2000-06-01), Umotoy et al.
patent: 6095083 (2000-08-01), Rice et al.
patent: 6123775 (2000-09-01), Hao et al.
patent: 6129808 (2000-10-01), Wicker et al.
patent: 6136128 (2000-10-01), Chung
patent: 6170429 (2001-01-01), Schoepp et al.
patent: 6173673 (2001-01-01), Golovato et al.
patent: 6194037 (2001-02-01), Terasaki et al.
patent: 6194322 (2001-02-01), Lilleland et al.
patent: 6237528 (2001-05-01), Szapucki et al.
patent: 6245192 (2001-06-01), Dhindsa et al.
patent: 6254993 (2001-07-01), Mercuri
patent: 6280584 (2001-08-01), Kumar et al.
patent: 6286451 (2001-09-01), Ishikawa et al.
patent: 6363624 (2002-04-01), Pang et al.
patent: 6376385 (2002-04-01), Lilleland et al.
patent: 6391787 (2002-05-01), Dhindsa et al.
patent: 6408786 (2002-06-01), Kennedy et al.
patent: 6415736 (2002-07-01), Hao et al.
patent: 6432831 (2002-08-01), Dhindsa et al.
patent: 6433314 (2002-08-01), Mandrekar et al.
patent: 6451157 (2002-09-01), Hubacek
patent: 6454898 (2002-09-01), Collins et al.
patent: 6473993 (2002-11-01), Yagi et al.
patent: 6477980 (2002-11-01), White et al.
patent: 6583064 (2003-06-01), Wicker et al.
patent: 6786175 (2004-09-01), Dhindsa et al.
patent: 6818096 (2004-11-01), Barnes et al.
patent: 7543547 (2009-06-01), Kennedy et al.
patent: 7645341 (2010-01-01), Kennedy et al.
patent: 7862682 (2011-01-01), Stevenson et al.
patent: 2001/0004879 (2001-06-01), Umotoy et al.
patent: 2001/0027026 (2001-10-01), Dhindsa et al.
patent: 2002/0069968 (2002-06-01), Keller et al.
patent: 2002/0088111 (2002-07-01), Von Arx et al.
patent: 2002/0150519 (2002-10-01), Barnes et al.
patent: 2003/0029569 (2003-02-01), Natsuhara et al.
patent: 2003/0054099 (2003-03-01), Jurgensen et al.
patent: 2003/0102304 (2003-06-01), Boyers
patent: 2003/0138560 (2003-07-01), Zhao et al.
patent: 2003/0205202 (2003-11-01), Funaki et al.
patent: 2005/0133160 (2005-06-01), Kennedy et al.
patent: 2007/0068629 (2007-03-01), Shih et al.
patent: 2007/0235660 (2007-10-01), Hudson
patent: 2008/0087641 (2008-04-01), de la Llera et al.
patent: 2008/0090417 (2008-04-01), de la Llera et al.
patent: 2008/0141941 (2008-06-01), Augustino et al.
patent: 2008/0308228 (2008-12-01), Stevenson et al.
patent: 2009/0081878 (2009-03-01), Dhindsa
patent: 2009/0111276 (2009-04-01), Dhindsa et al.
patent: 2009/0127234 (2009-05-01), Larson et al.
patent: 2009/0163034 (2009-06-01), Larson et al.
patent: 2009/0211085 (2009-08-01), Kennedy et al.
patent: 2009/0305509 (2009-12-01), Stevenson et al.
patent: 2010/0003824 (2010-01-01), Kadkhodayan et al.
patent: 2010/0003829 (2010-01-01), Patrick et al.
patent: 2010/0065214 (2010-03-01), Kennedy et al.
patent: 2010/0184298 (2010-07-01), Dhindsa
patent: 2010/0261354 (2010-10-01), Bettencourt et al.
patent: 2011/0070740 (2011-03-01), Bettencourt et al.
patent: 2011/0081783 (2011-04-01), Stevenson et al.
patent: 01160864 (1989-06-01), None
patent: H10-172719 (1998-06-01), None
International Search Report and Written Opinion mailed Mar. 2, 2006 for PCT/US04/42100.
International Preliminary Report on Patentability mailed Jul. 6, 2006 for PCT/US2004/042100.
Japanese Official Action mailed Nov. 22, 2010 for Japanese Patent Appln. No. 2006-547131.
Jacob David E.
Kennedy William S.
Buchanan & Ingersoll & Rooney PC
Lam Research Corporation
Lund Jeffrie R
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