Photoacid generators for extreme ultraviolet lithography

Details Photoacid generators for extreme ultraviolet lithography Photoacid generators for extreme ultraviolet lithography

2008-01-08

2011-10-18

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C558S427000, C558S432000, C570S183000, C570S187000

Reexamination Certificate

active

08039194

ABSTRACT:
A photoacid generator P+A−comprises (a) an antenna group P+comprising atoms with high EUV photoabsorption cross-sections according to FIG.1and A−anions; or (b) an antenna group P+and A−comprising anions with low photoabsorption cross-sections for EUV; or (c) an antenna group P+, comprising atoms with high EUV photoabsorption cross-sections according to FIG.1and A−comprising anions with low photoabsorption cross-sections for EUV. Novel compounds comprise DTFPIO PFBuS, and DTBPIO CN5.

REFERENCES:
patent: 3853943 (1974-12-01), Webster
patent: 6093753 (2000-07-01), Takahashi
patent: 6358665 (2002-03-01), Pawlowski et al.
patent: 6387587 (2002-05-01), Oomori et al.
patent: 6849374 (2005-02-01), Cameron
patent: 7202015 (2007-04-01), Kanna et al.
patent: 7214465 (2007-05-01), Nakao et al.
patent: 7214467 (2007-05-01), Kanna et al.
patent: 7232640 (2007-06-01), Mizutani et al.
patent: 7655379 (2010-02-01), Glodde et al.
patent: 2003/0194639 (2003-10-01), Miya et al.
patent: 2004/0023163 (2004-02-01), Yukawa et al.
patent: 2005/0221220 (2005-10-01), Meagley
patent: 2007/0128547 (2007-06-01), Mizutani et al.
U.S. Appl. No. 11/970,731, filed Jan. 8, 2008, Martin Giodde, et al.
EP 1338921, Mizutani, et al.
Wallraff, et al., Lithographic Imaging Techniques . . . ,Chem. Rev., 1999, 99, 1801-1821.
Crivello, The Discovery and Development of Onium . . . , Jour. Of Pol. Sci.: Part A: Pol. Chem., vol. 37, 4241-4254 (1999).
Vianello, et al. ,Towards highly powerful neutral organic .superacids . . . , Tetrahedron 61 (2005) 9381-9390.
Vianello, et al. , In Search of Ultrastrong Bronsted Neutral . . . , Superacids . . . ,Chem. Eur. J. 2004, 10, 5751-5760.
J. Org. Chem. 1958, 53, 5571-5573.
Richardson et al., Exploration of the Pentacyano-cycol-pewntadiene ion . . . ,Chem. Commun., 2004, 706-707.
Simmons et al., Thiacyanocarbons . . . ,J. Org. Chem. ,1980, 45, 5113-5121.

Affiliated with

Also associated with

Rating

Photoacid generators for extreme ultraviolet lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoacid generators for extreme ultraviolet lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoacid generators for extreme ultraviolet lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4298466