Chemically amplified resist composition and chemically...

Details Chemically amplified resist composition and chemically... Chemically amplified resist composition and chemically...

2009-03-02

2011-11-22

Chu, John (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S910000, C430S921000

Reexamination Certificate

active

08062829

ABSTRACT:
A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II).wherein X1represents a hydrogen atom, a C1to C4alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1to R4independently represent a hydrogen atom, an alkyl group, etc., and A+represents an organic counterion, E−represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1and Y2independently represent a fluorine atom or a C1to C6perfluoroalkyl group.

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