Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-12-21
2011-10-25
Hamilton, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000
Reexamination Certificate
active
08043792
ABSTRACT:
The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating composition comprises a particular naphthalene compound, a polymer, and a solvent. The composition is used for forming a top anti-reflection coating provided on a photoresist layer. From the photoresist layer, a pattern can be formed by use of light in 160 to 260 nm.
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Allura Red AC—Wikipedia, the free encyclopedia, down loaded Feb. 18, 2011, three pages at http://en.wikipedia.org/wiki/Allura—Red—AC. The text was last modified on Feb. 7, 2011.
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Akiyama Yasushi
Kobayashi Masakazu
Kuramoto Katsutoshi
AZ Electronic Materials USA Corp.
Hamilton Cynthia
Jain Sangya
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