Method for the deposition of a film by CVD or ALD

Details Method for the deposition of a film by CVD or ALD Method for the deposition of a film by CVD or ALD

2006-11-15

2011-11-01

Meeks, Timothy (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

Reexamination Certificate

active

08048484

ABSTRACT:
Methods and apparatus for deposition of a film on a substrate in a reaction chamber by an atomic layer deposition (ALD) or chemical vapor deposition (CVD) process include providing one or more reactants, and providing a volatile neutral coordinating ligand capable of coordinating at least one selected from the following: (i) one of the reactants; (ii) a reaction by-product formed during the deposition process. The neutral coordinating ligand thus improves volatility of either reactants and/or by-products, either in the gas phase or aiding in removal of species from reaction space surfaces. The neutral coordinating ligand is provided during the deposition process, either during or after reactant supply.

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