Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-03-13
2011-10-18
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S910000
Reexamination Certificate
active
08039198
ABSTRACT:
A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R1is H, F, methyl or trifluoromethyl, R2to R4are C1-C10alkyl or alkoxy, R5is C1-C30alkyl or C6-C14aryl, k, m and n are 0 to 3. The recurring units generate a sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition. The resist composition exhibits excellent resolution and a pattern finish with minimal LER.
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Hatakeyama Jun
Ohashi Masaki
Ohsawa Youichi
Tachibana Seiichiro
Birch & Stewart Kolasch & Birch, LLP
Chu John
Shin-Etsu Chemical Co. , Ltd.
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