Positive type resist composition for use in liquid immersion...

Details Positive type resist composition for use in liquid immersion... Positive type resist composition for use in liquid immersion...

2008-12-01

2011-10-18

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S905000, C430S913000, C430S945000

Reexamination Certificate

active

08039197

ABSTRACT:
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

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