Photosensitive composition and pattern-forming method using...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S280100, C430S325000, C430S326000, C430S905000, C430S920000, C430S921000, C430S922000, C430S925000

Reexamination Certificate

active

08039200

ABSTRACT:
A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II):wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents an alkyl group or a cycloalkyl group.

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