Resist composition, resist protective coating composition,...

Details Resist composition, resist protective coating composition,... Resist composition, resist protective coating composition,...

Filed on

2009-02-13

Date issued

2011-11-15

Examiner

Lee, Sin J. (Department: 1722)

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

C430S326000, C430S330000, C430S907000, C430S910000, C430S942000, C430S271100, C430S273100

Type

Reexamination Certificate

Status

active

Patent number

08057981

Description

ABSTRACT:
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects.

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