Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2003-11-19
2011-10-11
Kelly, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C540S122000, C540S135000, C540S139000
Reexamination Certificate
active
08034531
ABSTRACT:
The present invention relates to a photosensitive resin composition comprising a) as a component (A) a green colorant of the formula (I) in which the rings A, B, C and D are substituted by hydroxy or by moiety wherein R, is hydrogen or C1,-C4.-Alkyl, R2is hydrogen or C1,-C4-Alkyl, n is 0, 1, 2 or 3 and the ring E is unsubstituted or substituted by C1,-C6alkyl, C1,-C6alkoxy, hydroxy, NHCOR3, NHSO2, R4or SO2NHR5, wherein R3, is C1,-C4,-Alkyl or phenyl, R4, is C1,-C4-Alkyl or phenyl and R5is C1,-C4-Alkyl or phenyl, b) as a component (B) an alkali soluble oligomer or polymer (reactive or unreactive), c) as a component (C) a polymerizable monomer, d) as a component (D) a photoinitiator, e) as a component (E) an epoxy compound, and also, if desired, f) as a component (F) further additives, used as solder resist, etching resist or plating resist in the manufacture of printed circuit boards.
REFERENCES:
patent: 4039585 (1977-08-01), Homeier
patent: 4789620 (1988-12-01), Sasaki et al.
patent: 5009982 (1991-04-01), Kamayachi et al.
patent: 5594128 (1997-01-01), Wolleb
patent: 5691101 (1997-11-01), Ushirogouchi et al.
patent: 5789137 (1998-08-01), Itoh et al.
patent: 5854323 (1998-12-01), Itabashi et al.
patent: 6043355 (2000-03-01), Yashiro et al.
patent: 6051360 (2000-04-01), Karasawa et al.
patent: 6087492 (2000-07-01), Wolleb
patent: 6197472 (2001-03-01), Konrad et al.
patent: 6444807 (2002-09-01), Wolleb et al.
patent: 6533860 (2003-03-01), Hatakeyama et al.
patent: 6661770 (2003-12-01), Kakuta et al.
patent: 6726755 (2004-04-01), Titterington et al.
patent: 7144677 (2006-12-01), Yashiro
patent: 2002/0025402 (2002-02-01), Tronche et al.
patent: 2002/0077384 (2002-06-01), Sano et al.
patent: 2002/0136986 (2002-09-01), Chang et al.
patent: 9-279050 (1997-10-01), None
patent: 11-049773 (1999-02-01), None
patent: 2000-007974 (2000-01-01), None
patent: 2001-064534 (2001-03-01), None
patent: 2002309119 (2002-10-01), None
patent: 02-48794 (2002-06-01), None
Leznoff et al., “The Synthesis of 2,9,16,23- and 1,8,15,22-tetrahydroxyphthalocyanines.” Canadian Journal of Chemistry, vol. 72, pp. 1990-1998, Mar. 31, 1994.
English language abstract of JP2000-007974 printed from the esp@cenet web site on Jul. 27, 2009.
English language abstract of WO 02/048794 printed from the esp@cenet web site on Jul. 27, 2009.
English language abstract of JP 9 -279050 printed from the esp@cenet web site on Jul. 7, 2009.
Adam Jean-Marie
Oka Hidetaka
BASF SE
Johnson Connie P
Kelly Cynthia
Zhuo Qi
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