Polymerizable anion-containing sulfonium salt and polymer,...

Details Polymerizable anion-containing sulfonium salt and polymer,... Polymerizable anion-containing sulfonium salt and polymer,...

2009-08-27

2011-11-15

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S330000, C430S907000, C430S910000, C430S921000, C430S923000, C430S925000, C430S942000, C562S108000, C562S109000, C562S110000, C562S111000, C562S113000, C526S243000, C526S245000, C526S287000

Reexamination Certificate

active

08057985

ABSTRACT:
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1is H, F, methyl or trifluoromethyl, R2, R3and R4are C1-C10alkyl, alkenyl or oxoalkyl or C6-C18aryl, aralkyl or aryloxoalkyl, or two of R2, R3and R4may bond together to form a ring with S, A is a C1-C20organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

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