Registered structure formation via the application of...

Details Registered structure formation via the application of... Registered structure formation via the application of...

2007-03-06

2011-12-27

Alanko, Anita K (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S017000, C216S039000, C216S041000, C216S049000, C216S083000, C216S055000, C216S067000, C216S099000, C427S097500, C430S313000, C430S330000, C438S700000, C438S947000, C977S888000, C977S895000, C977S900000

Reexamination Certificate

active

08083953

ABSTRACT:
Methods for fabricating sublithographic, nanoscale linear microchannel arrays over surfaces without defined features utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Embodiments of the methods use a multilayer induced ordering approach to align lamellar films to an underlying base film within trenches, and localized heating to anneal the lamellar-phase block copolymer film overlying the trenches and outwardly over the remaining surface.

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