Ring-shaped component for use in a plasma processing, plasma...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support

Reexamination Certificate

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C118S728000

Reexamination Certificate

active

08038837

ABSTRACT:
A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inner ring-shaped member. The outer ring-shaped member has a first surface facing a processing space side and a second surface facing an opposite side of the plasma generation side. The second surface has thereon one or more ring-shaped grooves.

REFERENCES:
patent: 5800686 (1998-09-01), Littau et al.
patent: 6676804 (2004-01-01), Koshimizu et al.
patent: 2004/0069227 (2004-04-01), Ku et al.
patent: 2004/0129226 (2004-07-01), Strang et al.
patent: 2000-36490 (2000-02-01), None

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