Method for performing place-and-route of contacts and vias...

Details Method for performing place-and-route of contacts and vias... Method for performing place-and-route of contacts and vias...

2005-07-28

2010-06-29

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S394000, C716S030000, C716S030000

Reexamination Certificate

active

07745067

ABSTRACT:
Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein each of the areas in the first set of areas is within a first angle away from the first axis, and wherein each of the areas in the first set of areas is within a first distance away from the first feature, and patterning a second feature in at least one of the first set of areas so as to form a mask layout, wherein each of the first feature and the second feature are one of a virtual feature and a real feature.

REFERENCES:
patent: 6855486 (2005-02-01), Finders et al.
patent: 6928633 (2005-08-01), Teig et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.

Affiliated with

Also associated with

Rating

Method for performing place-and-route of contacts and vias... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for performing place-and-route of contacts and vias..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for performing place-and-route of contacts and vias... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4246061