Method of plasma etching of high-K dielectric materials

Details Method of plasma etching of high-K dielectric materials Method of plasma etching of high-K dielectric materials

2006-08-14

2010-11-23

Vinh, Lan (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S714000, C216S080000

Reexamination Certificate

active

07838434

ABSTRACT:
A method of etching high dielectric constant materials using a halogen gas, a reducing gas and an etch rate control gas chemistry.

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