Photomask

Details Photomask Photomask

2004-09-21

2010-11-30

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07842436

ABSTRACT:
A pattern121provided on a transparent substrate100as a mask pattern includes partial patterns121A and121B. Each of the partial patterns121A and121B has a mask enhancer structure including a phase shifter102for transmitting exposing light in an opposite phase with respect to a transparent portion and a shielding portion101surrounding the phase shifter102.The partial pattern121A is close to other patterns122and123at distances not larger than a given distance with the transparent portion sandwiched therebetween. The width of the phase shifter102A of the partial pattern121A is smaller than the width of the phase shifter102B of the partial pattern121B.

REFERENCES:
patent: 5718829 (1998-02-01), Pierrat
patent: 6586168 (2003-07-01), Ohsaki
patent: 6703168 (2004-03-01), Misaka
patent: 2002/0155362 (2002-10-01), Heissmeier et al.
patent: 2004/0029023 (2004-02-01), Misaka
patent: 2004/0121244 (2004-06-01), Misaka
patent: 0 401 795 (1990-12-01), None
patent: 3-170928 (1991-07-01), None
patent: 8-22114 (1996-01-01), None
patent: 2001-174974 (2001-06-01), None
patent: WO 01/35166 (2001-05-01), None
patent: WO 02/091079 (2002-11-01), None
patent: WO02/091079 (2002-11-01), None

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