Dielectric substrate with reflecting films

Details Dielectric substrate with reflecting films Dielectric substrate with reflecting films

2005-10-19

2010-06-29

Wilson, Allan R. (Department: 2815)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257SE31127

Reexamination Certificate

active

07745880

ABSTRACT:
A semiconductor device has a transparent dielectric substrate such as a sapphire substrate. To enable fabrication equipment to detect the presence of the substrate optically, the back surface of the substrate is coated with a triple-layer light-reflecting film, preferably a film in which a silicon oxide or silicon nitride layer is sandwiched between polycrystalline silicon layers. This structure provides high reflectance with a combined film thickness of less than half a micrometer.

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patent: 07-283383 (1995-10-01), None
patent: 11-220114 (1999-08-01), None

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