Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-10-07
2010-10-12
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S907000
Reexamination Certificate
active
07811740
ABSTRACT:
A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.
REFERENCES:
patent: 6010834 (2000-01-01), McGuckin et al.
patent: 6479211 (2002-11-01), Sato et al.
patent: 6645692 (2003-11-01), Namba
patent: 2002/0012874 (2002-01-01), Namba
patent: 2002/0155383 (2002-10-01), Fujimori et al.
patent: 2003/0031950 (2003-02-01), Uenishi et al.
patent: 2004/0175654 (2004-09-01), Yasunami et al.
patent: 2005/0019690 (2005-01-01), Kodama
patent: 2005/0260528 (2005-11-01), Kong et al.
patent: 2005/0266335 (2005-12-01), Johnson et al.
patent: 2006/0008736 (2006-01-01), Kanda et al.
patent: 2006/0154170 (2006-07-01), Endo et al.
patent: 2007/0190448 (2007-08-01), Ishiduka et al.
patent: 0 952 489 (1999-10-01), None
patent: 1 580 598 (2005-09-01), None
patent: 63-49893 (1988-10-01), None
patent: 6-124873 (1994-05-01), None
patent: 10-303114 (1998-11-01), None
patent: 2000338676 (2000-12-01), None
patent: 2001-125259 (2001-05-01), None
patent: 2002-006483 (2002-01-01), None
patent: 2003-105207 (2003-04-01), None
patent: 2005-284238 (2005-10-01), None
www.omnova.com.
“New Technology Offers Green Light to Develop Better Coatings”, Dr. Barry Rosenbaum, Paint & Coatings Industry, Nov. 1, 2002.
www.pcimag.com, Rosenbaum, Barry. “Novel Fluorinated Materials Replace Long Chain Surfactants”, May 31, 2002, Omnova Solutions, Inc. pp. 1-9.
European Search Report dated Feb. 24, 2006.
Korean Patent Office Action issued in Korean Patent Application No. 10-2009-0110354 dated Jan. 8, 2010.
Japanese Notice of Reasons for Rejection dated Aug. 19, 2009, English language translation.
Kanda Hiromi
Nishiyama Fumiyuki
FUJIFILM Corporation
Johnson Connie P
Kelly Cynthia H
Sughrue & Mion, PLLC
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