Gas distribution assembly for use in a semiconductor work...

Details Gas distribution assembly for use in a semiconductor work... Gas distribution assembly for use in a semiconductor work...

2006-11-20

2010-02-09

Cleveland, Michael (Department: 1792)

Coating apparatus

Gas or vapor deposition

C156S345340

Reexamination Certificate

active

07658800

ABSTRACT:
A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.

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