Positive photoresists containing novel photoactive compounds

Details Positive photoresists containing novel photoactive compounds Positive photoresists containing novel photoactive compounds

1997-03-07

1999-03-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430326, 430330, G03F 7023, G03F 730

Patent

active

058768971

ABSTRACT:
A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl,

REFERENCES:
patent: 2859112 (1958-11-01), Sus et al.
patent: 3522049 (1970-07-01), Poot et al.
patent: 3592646 (1971-07-01), Holstead et al.
patent: 4284706 (1981-08-01), Clecak et al.
patent: 4339522 (1982-07-01), Balanson et al.
patent: 4339552 (1982-07-01), Lindemann
patent: 4522911 (1985-06-01), Clecak et al.
patent: 4588670 (1986-05-01), Kelly et al.
patent: 4601969 (1986-07-01), Clecak et al.
patent: 4622283 (1986-11-01), Gray
patent: 4624908 (1986-11-01), Schwartzkopf
patent: 4626491 (1986-12-01), Gray
patent: 4735885 (1988-04-01), Hopf et al.
patent: 4752551 (1988-06-01), Schwarzkopf
patent: 4853315 (1989-08-01), McKean et al.
patent: 5171656 (1992-12-01), Sebald et al.
patent: 5501936 (1996-03-01), Hosoda et al.
patent: 5532107 (1996-07-01), Oie et al.
patent: 5541033 (1996-07-01), Blakeney et al.
Derwent Abstract, Japanese 3079670, Nippon Kayaku KK, Aug. 23, 1989.
Derwent Abstract, Japanese 2061640, Toshiba KK, Aug. 26, 1988.
"Diazocyclopentadiene" by W. von E. Doering and C.H. DePuy, the Journal of the American Chemical Society, vol. 75, pp. 5955-5957, May 8, 1953.

Affiliated with

Also associated with

Rating

Positive photoresists containing novel photoactive compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresists containing novel photoactive compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresists containing novel photoactive compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-421065