Method for manufacturing electro-optic device substrate with...

Details Method for manufacturing electro-optic device substrate with... Method for manufacturing electro-optic device substrate with...

2007-06-05

2010-10-19

Vu, Hung (Department: 2811)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S151000, C438S682000, C438S683000, C257SE29151

Reexamination Certificate

active

07816258

ABSTRACT:
An electro-optic device substrate includes a base and a TFT element having a source region and a drain region disposed on the base. The TFT element includes a silicon layer in the source region or the drain region, and the silicon layer at least partially includes a silicided portion. The electro-optic device substrate also includes a metal wire connected to the silicided portion of the silicon layer.

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