System and method for measuring overlay errors

Details System and method for measuring overlay errors System and method for measuring overlay errors

2003-10-22

2010-11-30

Johnston, Phillip A (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S491100, C430S022000

Reexamination Certificate

active

07842933

ABSTRACT:
A system and method for detecting overlay errors, the method includes (i) directing a primary electron beam to interact with an inspected object; whereas the inspected object comprises a first feature formed on a first layer of the inspected object and a second feature formed on a second layer of the object, wherein the second feature is buried under the first layer and wherein the second feature affects a shape of an area of the first layer; (ii) detecting electrons reflected or scattered from the area of the first layer; and (iii) receiving detection signals from at least one detector and determining overlay errors.

REFERENCES:
patent: 3849659 (1974-11-01), O'Keeffe
patent: 4896036 (1990-01-01), Rose et al.
patent: 4926054 (1990-05-01), Frosien
patent: 5659172 (1997-08-01), Wagner et al.
patent: 5895917 (1999-04-01), Ueda et al.
patent: 5900629 (1999-05-01), Todokoro et al.
patent: 5939720 (1999-08-01), Todokoro
patent: 5952241 (1999-09-01), Baker et al.
patent: 6037589 (2000-03-01), Yonezawa et al.
patent: 6064486 (2000-05-01), Chen et al.
patent: 6066853 (2000-05-01), Nakasuji
patent: 6172365 (2001-01-01), Hiroi et al.
patent: 6184526 (2001-02-01), Kohama et al.
patent: 6194729 (2001-02-01), Weimer
patent: 6232601 (2001-05-01), Schmitt et al.
patent: 6287734 (2001-09-01), Imai
patent: 6291870 (2001-09-01), Kawashima et al.
patent: 6365897 (2002-04-01), Hamashima et al.
patent: 6407388 (2002-06-01), Frosien
patent: 6407396 (2002-06-01), Mih et al.
patent: 6463184 (2002-10-01), Gould et al.
patent: 6489068 (2002-12-01), Kye
patent: 6498068 (2002-12-01), Ueda et al.
patent: 6501077 (2002-12-01), Sawahata et al.
patent: 6555819 (2003-04-01), Suzuki et al.
patent: 6589385 (2003-07-01), Minami et al.
patent: 6590210 (2003-07-01), Essers
patent: 6674075 (2004-01-01), Petrov et al.
patent: 6778275 (2004-08-01), Bowes
patent: 2002/0185599 (2002-12-01), Kimura et al.
patent: 99/46797 (1999-09-01), None
patent: 01/45136 (2001-06-01), None
patent: 02/37523 (2002-05-01), None
Frosien, J. “Compound Magnetic and electrostatic Lenses for Low-Voltage Applications”, Journal of Vacuum Science and Technology: Part B, American Institute of Physics, New York US, vol. 7, No. 6, 18XP000117179, ISSN: 1071-1023, Nov. 1, 1989), 1871-1877.
Applied Materials Israel, Ltd., International Search Report and Written Opinion, PCT/US2004/012468 filed Apr. 22, 2004, ISA/EP, mailed Oct. 29, 2004, 18 pp.
Applied Materials, Inc.; PCT/US03/15018 filed May 12, 2003; International Search Report, ISA/EP, mailed Jan. 26, 2004, 9 pp.
Patent Abstracts of Japan, vol. 1998, No. 13, Nov. 30, 1998- & JP 10 214586 A (Horon: KK), Aug. 11, 1998, abstract; figures 1, 2.
Patent Abstracts of Japan, vol. 1999, No. 11, Sep. 30, 1999, JP 11 162384 1 pg.
Patent Abstracts of Japan, vol. 01, No. 385 (P-1094), Aug. 20, 1990- & JP 02 145947 A (Shimadzu Corp), Jun. 5, 1990, abstract; figure 1.

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