Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2004-02-06
2010-12-28
Nguyen, Thanh (Department: 2893)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S597000, C438S674000, C257SE21001
Reexamination Certificate
active
07858453
ABSTRACT:
A step of forming wiring using first solution ejection means for ejecting a conductive material, a step of forming a resist mask on the wiring using second solution ejection means, and a step of etching the wiring using an atmospheric-pressure plasma device having linear plasma generation means or an atmospheric-pressure plasma device having a plurality of linearly-arranged plasma-generation-means using the resist mask as a mask are included.
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Costellia Jeffrey L.
Nguyen Thanh
Nixon & Peabody LLP
Semiconductor Energy Laboratory Co,. Ltd.
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