Method of removing residual corrosive compounds by plasma etchin

Details Method of removing residual corrosive compounds by plasma etchin Method of removing residual corrosive compounds by plasma etchin

1990-02-09

1991-04-16

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 3, 156651, H01L 21306

Patent

active

050079816

ABSTRACT:
A sample is plasma etched and then treated with a second plasma to remove residual corrosive compounds formed by the etching plasma. Removal of the residual corrosive compounds and prevention of corrosion is improved by washing the surface of the sample after the second plasma treatment with at least one liquid in order to effect at least one of (a) removal of the residual corrosive compounds and (b) passivation of the surface, the step of washing is followed by drying the sample.

REFERENCES:
patent: 4487678 (1984-12-01), Noguchi et al.
patent: 4690730 (1987-09-01), Tang et al.
patent: 4693777 (1987-09-01), Hazano et al.
patent: 4816098 (1989-03-01), Davis et al.
patent: 4904339 (1990-02-01), Diehl et al.

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