Semiconductor device including a P-type field-effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S627000, C257S649000, C257SE29151

Reexamination Certificate

active

07812398

ABSTRACT:
A semiconductor device and manufacturing method of the same is provided in which the driving current of a pMOSFET is increased, through a scheme formed easily using an existing silicon process. A pMOSFET is formed with a channel in a <100> direction on a (100) silicon substrate. A compressive stress is applied in a direction perpendicular to the channel by an STI.

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patent: 2008/0203487 (2008-08-01), Hohage et al.
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